UV ultraviolet light cleaning cleaning technology principle and light characteristics 2014-2-11

UV cleaning technology in the rookie, UV ultraviolet light cleaning technology, working principle, characteristics and applications) with the rapid development of optoelectronic industry, cleaning process is necessary in photoelectric product, clean to product quality, precision, appearance of influence is more and more important. How to ensure high reliability and high yield of products? How to ensure the safety of production and environmental protection in the process of production? So, for the user: choose high cleanliness, and also has the security, environmental protection performance is particularly important cleaning equipment, cleaning technology of the past (chemical cleaning and physical cleaning), it is difficult to meet the requirements. In security and environmental protection under the premise of how to thoroughly remove dirt on the surface of the object? Currently widely used abroad clean method is ultraviolet (UV) light clean, on one hand it can avoid pollution because of use organic solvent, at the same time to shorten the cleaning process
The working principle of a, uv cleaning:
Uv cleaning technology is the use of photosensitive oxidation of organic compounds to remove adhesion on the surface of organic material, after light cleaning of the surface of the material can achieve "cleanliness" atom. More detailed: the UV light source emission wavelength of 185 nm and 254 nm light, has the very high energy, when these photons to the cleaning surfaces, since most hydrocarbons to 185 nm wavelength ultraviolet light has strong absorption ability, and the energy absorption of 185 nm wavelength ultraviolet light after decomposed into ions, free atoms, excited molecule and neutron, this is the so-called photosensitization. Molecular oxygen in the air after the absorption of a 185 nm wavelength ultraviolet also can produce ozone and oxygen atom. Ozone on 254 nm wavelength ultraviolet light also has strong absorption, ozone and decomposed into atomic oxygen and oxygen. Of atomic oxygen is very lively, in the role of it, on the surface of carbon and hydrocarbons decomposition can be combined into a volatile gas, such as carbon dioxide and water vapour to escape the surface, so as to thoroughly remove the adhesion on the surface of carbon and organic pollutants.
When cleaning, make the base board to wet up. Glass is conveying roller way, ultraviolet irradiation device above the low pressure mercury lamp. Glass substrates are cumulative uv energy, the more the less the surface water contact, inversely proportional relationship.
Generally the STN LCD - making process, the demand of glass cumulative uv energy to 300 mj/cm2 (more than 253.7 nm). While colour the STN LCD and color filter production process, the requirements of the glass substrate cumulative uv energy to 600 mj/cm2 (253.7 nm). In the process of TFT - LCD production, in addition to the low pressure mercury Lamp produce ozone cleaning glass, the mainstream of the current process is, using Excimer Lamp, the 172 nm wavelength ultraviolet high response properties of the glass cleaning efficiency is better.
Second, the characteristics of uv cleaning:
1, is a way of no contact, can be in the air and need not to dry after washing.
2, can thoroughly remove carbon and organic pollutants on the surface of the object.
3, without solvent volatilization and waste solvent processing problems.
4, to ensure product high reliability and high yield.
5, product surface cleaning processing evenness.
6, the light clean photosensitive, oxidation reaction is by removing carbon and organic compounds on the surface of the object, so prone to oxidation surface should not be light cleaning method, only suitable for the surface dirt cleaning, discomfort for dirt is more, inorganic kind the dirt to clean.
Three, uv cleaning technology application range:
Mainly in liquid crystal display device, semiconductor silicon wafers, integrated circuit, high precision printed circuit boards, optical device, quartz crystal, sealing technology, with oxide film of metal materials used in the process of producing light cleaning method is most appropriate.
Main material: ITO glass, optical glass, chrome plate, mask plate, polishing quartz crystal, silicon wafers with oxide film of metal precision cleaning processing, etc.
Can remove dirt, organic dirt, human sebum, cosmetic grease, resin and polyimide, paraffin wax, rosin, lubricating oil additives, such as the remnants of the photoresist.
The UV light source in the LCD technology and UV the characteristics of the modified surface quality (UV light), currently in the process of the STN LCD production, mainly used in film processing technology, to improve the contact between film and film is very effective, such as ITO film and photographic film layer, TOP coating and PI coating and so on. In the research department and can be used for UV products, modified plastics materials for nanotechnology research, product by the UV light irradiation produces chemical reaction, make the product surface properties change.